Influence of substrate thickness on thermal impedance of microelectronic structures

نویسندگان

  • Bjorn Vermeersch
  • Gilbert De Mey
چکیده

The thermal impedance Zth(jx) has been calculated numerically, using the boundary element method, for a silicon substrate with a uniform heat source on top. The key feature is that the dynamic thermal behaviour is calculated directly in the frequency domain. The calculations were performed for a wide range of values for the thickness of the substrate. By representing the thermal impedance in a Nyquist plot (i.e. Im[Zth(jx)] vs. Re[Zth(jx)] with x as parameter), mainly two circular arcs are observed. For the lower frequency arc, the impedance values as well as the frequency scale are found to be largely influenced by the substrate thickness. The arc corresponding to high frequencies on the other hand remains unchanged under thickness variations. Further analysis revealed an almost perfectly linear relationship between the thermal resistance Rth = Zth(jx = 0) and the substrate thickness, even when the heat source is not centred on the substrate. Both the slope and intersection value obtained from the curve fitting can be explained by a simple geometrical model including the fixed-angle heat spreading approximation, used since many years in the literature. 2006 Elsevier Ltd. All rights reserved.

برای دانلود رایگان متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Effect of Thickness on Structural and Morphological Properties of AlN Films Prepared Using Single Ion Beam Sputtering

Aluminum nitride (AlN) thin films have potential applications in microelectronic and optoelectronic devices. In this study, AlN thin films with different thicknesses were deposited on silicon substrate by single ion beam sputtering method. The X-ray diffraction (XRD) spectra revealed that the structure of films with thickness of - nm was amorphous, while the polycrystalline hexagonal AlN with a...

متن کامل

Influence of Thickness and Number of Silver Layers in the Electrical and Optical Properties of ZnO/Ag/ZnO/Ag/ZnO ultra-Thin Films Deposited on the Glass for Low-Emissivity Applications

We report on transparent ZnO/Ag/ZnO and ZnO/Ag/ZnO/Ag/ZnO thin-films were deposited on the glass substrate by RF and DC sputtering for ZnO and Ag targets, respectively. The electrical and optical properties of the single and double Low Emissivity coatings were investigated with respect to the deposition time of Ag mid layer. The visible transmittance remains about 65% for single and 45% for...

متن کامل

BEM calculation of the complex thermal impedance of microelectronic devices

This paper presents a numerical method for modelling the dynamic thermal behaviour of microelectronic structures in the frequency domain. A boundary element method (BEM) based on a Green’s function solution is proposed for solving the 3D heat equation in phasor notation. The method is capable of calculating the AC temperature and heat flux distributions and complex thermal impedance for package...

متن کامل

Study the Effect of Silicon Nanowire Length on Characteristics of Silicon Nanowire Based Solar Cells by Using Impedance Spectroscopy

Silicon nanowire (SiNW) arrays were produced by electroless method on polycrystalline Si substrate, in HF/ AgNO3 solution. Although the monocrystalline silicon wafer is commonly utilized as a perfect substrate, polycrystalline silicon as a low cost substrate was used in this work for photovoltaic applications. In order to study the influence of etching time (which affects the SiNWs length) on d...

متن کامل

Microelectronic Materials Characterization: an Update

In a previous article, I various microelectronic materials analysis and characterization tools and techniques were presented with a focus on ensuring the quality of APL'S microelectronic products. Those tools and techniques can also be applied to the development of new materials and products for current and future microelectronics applications. This article discusses the development, characteri...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

عنوان ژورنال:
  • Microelectronics Reliability

دوره 47  شماره 

صفحات  -

تاریخ انتشار 2007